Manufacturing / Production Technology, Hardware & Services


Flux residue cleaning even with low ultrasonic power

3 October 2007 Manufacturing / Production Technology, Hardware & Services

Zestron's new cleaning medium Zestron FA+ has a very wide process window, which ensures the removal of flux residues from electronic assemblies even with very low ultrasonic power. It is based on halogen-free, organic solvents and used for the defluxing of electronic assemblies in batch cleaning processes. The cleaner can easily be rinsed off residue-free using water. Additionally, it is characterised by an extremely high bath loading capability, which results in very long bath lifetimes.



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